- Wafer surface temperature is measured at 9-points over whole silicon wafer.
- Thermal uniformity CV (sigma/mean) is better than 0.63 % over whole wafer.
- Temperature fluctuation is slow over > 10 min and smaller than 0.5 % of Set Value (SV) temperature.
- The controller has Auto-Tuning (AT) function of PID (Proportional/Integral/Differential) control.
- One may need AT after the initial installation and/or different environment, for the more stable and tight control.
- Each hot plate has factory setting for PID control, which is good in most cases and a starting point for AT in case.
- This model is for the fixed temperature operation.
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